Improving the performance of 193-nm photoresists based on alicyclic polymers

Improving the performance of 193-nm photoresists based on alicyclic polymers

著者名:

Patterson,K. ( Univ.of Texas at Austin )

Okoroanyanwu,U. ( Univ.of Texas at Austin )

Shimokawa,T. ( Univ.of Texas at Austin )

Cho,S. ( Univ.of Texas at Austin )

Byers,J.D. ( SEMATECH )

Willson,C.G. ( Univ.of Texas at Austin )

さらに 1 件

掲載資料名:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3333

発行年:

1998

巻:

Part 1

開始ページ:

425

終了ページ:

437

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

言語:

英語

請求記号:

P63600/3333

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018317
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	1998 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

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