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Novel antireflective structure for metal layer patterning

著者名:
Choi,S.-S. ( Electronics and Telecommunications Research Institute (Korea) )
Cha,H.S. ( Hanyang Univ.(Korea) )
Kim,J.-S. ( Electronics and Telecommunications Research Institute (Korea) )
Park,J.M. ( Electronics and Telecommunications Research Institute (Korea) )
Kim,D.H. ( Electronics and Telecommunications Research Institute (Korea) )
Lee,K.H. ( Electronics and Telecommunications Research Institute (Korea) )
Ahn,J. ( Hanyang Univ.(Korea) )
Chung,H.B. ( Electronics and Telecommunications Research Institute (Korea) )
Kim,B.W. ( Electronics and Telecommunications Research Institute (Korea) )
さらに 4 件
掲載資料名:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3333
発行年:
1998
巻:
Part 1
開始ページ:
336
終了ページ:
346
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
言語:
英語
請求記号:
P63600/3333
資料種別:
国際会議録

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