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Probabilistic model for the mechanism of phenolic polymer dissolution

著者名:
Flanagin,L.W. ( Univ.of Texas at Austin )
McAdams,C.L. ( Univ.of Texas at Austin )
Tsiartas,P.C. ( Univ.of Texas at Austin )
Henderson,C.L. ( Univ.of Texas at Austin )
Hinsberg,W.D. ( IBM Almaden Research Ctr. )
Willson,C.G. ( Univ.of Texas at Austin )
さらに 1 件
掲載資料名:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3333
発行年:
1998
巻:
Part 1
開始ページ:
268
終了ページ:
277
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
言語:
英語
請求記号:
P63600/3333
資料種別:
国際会議録

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