Positive- and negative-tone water-processable photoresists: a progress report

Positive- and negative-tone water-processable photoresists: a progress report

著者名:

Yamada,S. ( Univ.of Texas at Austin )

Medeiros,D.R. ( Univ.of Texas at Austin )

Patterson,K. ( Univ.of Texas at Austin )

Jen,W.-L.K. ( Univ.of Texas at Austin )

Rager,T. ( Univ.of Texas at Austin )

Lin,Q. ( Univ.of Texas at Austin )

Lenci,C. ( Univ.of Texas at Austin )

Byers,J.D. ( SEMATECH )

Havard,J.M. ( Univ.of California/Berkeley )

Pasini,D. ( Univ.of California/Berkeley )

Frechet,J.M.J. ( Univ.of California/Berkeley )

Willson,C.G. ( Univ.of Texas at Austin )

さらに 7 件

掲載資料名:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3333

発行年:

1998

巻:

Part 1

開始ページ:

245

終了ページ:

253

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

言語:

英語

請求記号:

P63600/3333

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018317
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	1998 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

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2 国際会議録 Design of a positive-tone water-soluble resist Havard,J.M., Frechet,J.M.J., Pasini,D., Mar,B., Yamada,S., Medeiros,D.R., Willson,C.G. SPIE-The International Society for Optical Engineering	8 国際会議録 Negative-tone 193-nm resists Cho,S., Heyden,A.Vander, Byers,J.D., Willson,C.G. SPIE - The International Society for Optical Engineering
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