Positive bilayer resists for 248-and 193-nm lithography

Positive bilayer resists for 248-and 193-nm lithography

著者名:

Sooriyakumaran,R. ( IBM Almaden Research Ctr. )

Wallraff,G.M. ( IBM Almaden Research Ctr. )

Larson,C.E. ( IBM Almaden Research Ctr. )

Fenzel-Alexander,D. ( IBM Almaden Research Ctr. )

DiPietro,R.A. ( IBM Almaden Research Ctr. )

Opitz,J. ( IBM Almaden Research Ctr. )

Hofer,D.C. ( IBM Almaden Research Ctr. )

LaTulipe,D.C.,Jr. ( IBM Thomas J. Watson Research Ctr. )

Simons,J.P. ( IBM Thomas J. Watson Research Ctr. )

Petrillo,K.E. ( IBM Thomas J. Watson Research Ctr. )

Babich,K. ( IBM Thomas J. Watson Research Ctr. )

Angelopoulos,M. ( IBM Thomas J. Watson Research Ctr. )

Lin,Q. ( IBM Microelectronics Div. )

Katnani,A.D. ( IBM Microelectronics Div. )

さらに 9 件

掲載資料名:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3333

発行年:

1998

巻:

Part 1

開始ページ:

219

終了ページ:

227

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

言語:

英語

請求記号:

P63600/3333

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018317
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	1998 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

類似資料:

1 国際会議録 High-resolution 248-nm bilayer resist Lin, Q., Petrillo, K. E., Babich, K., Tulipe, D. C. La, Medeiros, D., Mahorowala, A., Simons, J. P., Angelopoulos, M., … SPIE - The International Society of Optical Engineering	7 国際会議録 Role of photoacid structure on the performance of 193-nm resists Allen,R.D., Opitz,J., Larson,C.E., DiPietro,R.A., Breyta,G., Hofer,D.C. SPIE-The International Society for Optical Engineering
2 国際会議録 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers Sooriyakumaran,R., Fenzel-Alexander,D., Brock,P.J., Larson,C.E., DiPietro,R.A., Wallraff,G.M., Hofer,D.C., Dawson,D.J., … SPIE - The International Society for Optical Engineering	8 国際会議録 193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system R.D. Allen, G.M. Wallraff, R.A. DiPietro, D.C. Hofer, R.R. Kunz Society of Photo-optical Instrumentation Engineers
3 国際会議録 Extension of 248-nm optical lithography: a thin film imaging approach Lin,Q., Katnani,A.D., Brunner,T.A., DeWan,C., Fairchok,C., LaTulipe,D.C.,Jr., Simons,J.P., Petrillo,K.E., Babich,K., … SPIE-The International Society for Optical Engineering	9 国際会議録 Protecting groups for 193-nm photoresists Allen,R.D., Sooriyakumaran,R., Opitz,J., Wallraff,G.M., DiPietro,R.A., Breyta,G., Hofer,D.C., Kunz,R.R., Jayaraman,S., … SPIE-The International Society for Optical Engineering
4 国際会議録 Effects of underlayer on performance of bilayer resists for 248-nm lithography Babich,K., Callegari,A., Petrillo,K.E., Simons,J.P., LaTulipe,D.C.,Jr., Angelopoulos,M., Lin,Q. SPIE-The International Society for Optical Engineering	10 国際会議録 Design Considerations for 193-nm Positive Resists Allen, Robert D., Wan, I- Y., Wallraff, Gregory M., DiPietro, Richard A., Hofer, Donald C., Kunz, Roderick R. American Chemical Society
5 国際会議録 Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists Allen, Robert D., Opitz, Juliann, Larson, Carl E., Wallow, Thomas I., DiPietro, Richard A., Breyta, Gregory, … American Chemical Society	11 国際会議録 "IBM 193-nm bilayer resist: materials, lithographic performance, and optimization" Kwong,R.W., Varanasi,P.R., Lawson,M.C., Hughes,T., Jordhamo,G.M., Khojasteh,M., Mahorowala,A.P., Sooriyakumaran,R., … SPIE-The International Society for Optical Engineering
6 国際会議録 Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm Opitz,J., Allen,R.D., Wallow,T.I., Wallraff,G.M., Hofer,D.C. SPIE-The International Society for Optical Engineering	12 国際会議録 Limits to etch resistance for 193-nm single-layer resists Kunz,R.R., Palmateer,S.C., Forte,A.R., Allen,R.D., Wallraff,G.M., DiPietro,R.A., Hofer,D.C. SPIE-The International Society for Optical Engineering

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