Reactive ion etching of 193-nm resist candidates: current platforms and future requirements

Reactive ion etching of 193-nm resist candidates: current platforms and future requirements

著者名:

Wallow,T.I. ( IBM Almaden Research Ctr. )

Brock,P.J. ( IBM Almaden Research Ctr. )

DiPietro,R.A. ( IBM Almaden Research Ctr. )

Allen,R.D. ( IBM Almaden Research Ctr. )

Opitz,J. ( IBM Almaden Research Ctr. )

Sooriyakumaran,R. ( IBM Almaden Research Ctr. )

Hofer,D.C. ( IBM Almaden Research Ctr. )

Meute,J. ( SEMATECH )

Byers,J.D. ( SEMATECH )

Rich,G.K. ( SEMATECH )

McCallum,M. ( SEMATECH )

Schuetze,S. ( SEMATECH )

Jayaraman,S. ( BFGoodrich )

Hullihen,K. ( BFGoodrich )

Vicari,R. ( BFGoodrich )

Rhodes,L.F. ( BFGoodrich )

Goodall,B.L. ( BFGoodrich )

Shick,R.A. ( BFGoodrich )

さらに 13 件

掲載資料名:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3333

発行年:

1998

巻:

Part 1

開始ページ:

92

終了ページ:

101

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

言語:

英語

請求記号:

P63600/3333

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018317
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	1998 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

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1 国際会議録 Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms Wallow, T. I., Brock, P. J., DiPietro, R. A., Allen, R. D., Opitz, J., Sooriyakumaran, R., Hofer, D. C., Mewherter, A. … SPIE - The International Society of Optical Engineering	7 国際会議録 Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists Allen, Robert D., Opitz, Juliann, Larson, Carl E., Wallow, Thomas I., DiPietro, Richard A., Breyta, Gregory, … American Chemical Society
2 国際会議録 Design of an etch-resistant cyclic olefin photoresist Allen,R.D., Opitz,J., Wallow,T.I., DiPietro,R.A., Hofer,D.C., Jayaraman,S., Hullihan,K.A., Rhodes,L.F., Goodall,B.L., … SPIE-The International Society for Optical Engineering	8 国際会議録 Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins) Varanasi, P. R., Maniscalco, J., Mewherter, A. M., Lawson, M. C., Jordhamo, G., Allen, R. D., Opitz, J., Ito, H., … SPIE - The International Society of Optical Engineering
3 国際会議録 Approaches to etch-resistant 193-nm photoresists: performance and prospects Allen, R. D., Opitz, J., Ito, H., Wallow, T. I., Casmier, D. V., DiPietro, R. A., Brock, P. J., Breyta, G., … SPIE - The International Society of Optical Engineering	9 国際会議録 193-nm negative resist based on acid-catalyzed elimination of polar molecules Sooriyakumaran, R., Davis, B.W., Larson, C.E., Brock, P.J., DiPietro, R.A., Wallow, T.I., Connor, E.F., Sundberg, L.K., … SPIE - The International Society of Optical Engineering
4 国際会議録 Protecting groups for 193-nm photoresists Allen,R.D., Sooriyakumaran,R., Opitz,J., Wallraff,G.M., DiPietro,R.A., Breyta,G., Hofer,D.C., Kunz,R.R., Jayaraman,S., … SPIE-The International Society for Optical Engineering	10 国際会議録 Role of photoacid structure on the performance of 193-nm resists Allen,R.D., Opitz,J., Larson,C.E., DiPietro,R.A., Breyta,G., Hofer,D.C. SPIE-The International Society for Optical Engineering
5 国際会議録 New approaches to production-worthy 193-nm photoresists based on acrylic copolymers Wallow,T.I., Allen,R.D., Opitz,J., Dipietro,R.A., Brock,P.J., Sooriyakumaran,R., Hofer,D.C. SPIE-The International Society for Optical Engineering	11 国際会議録 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers Sooriyakumaran,R., Fenzel-Alexander,D., Brock,P.J., Larson,C.E., DiPietro,R.A., Wallraff,G.M., Hofer,D.C., Dawson,D.J., … SPIE - The International Society for Optical Engineering
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