Multilevel microstructure fabrication using single-step 3D photolithography and single-step electroplating

Multilevel microstructure fabrication using single-step 3D photolithography and single-step electroplating

著者名:

Yoon,J.-B. ( Korea Advanced Institute of Science and Technology )
Lee,J.-D. ( Korea Advanced Institute of Science and Technology )
Han,C.-H. ( Korea Advanced Institute of Science and Technology )
Yoon,E. ( Korea Advanced Institute of Science and Technology )
Kim,C.-K. ( Korea Advanced Institute of Science and Technology )

掲載資料名:

Materials and Device Characterization in Micromachining

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3512

発行年:

1998

開始ページ:

358

終了ページ:

366

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819429711 [0819429716]

言語:

英語

請求記号:

P63600/3512

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018307
シリーズID:	PA00000029
会議名:	Micromachining and Microfabrication : Materials and Device Characterization in Micromachining
回次:	1998
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.09.21-1998.09.22

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1 国際会議録 Novel and high-yield fabrication of electroplated 30 microcoils for MEMS and microelectronics Yoon,J.-B., Han,C.-H., Yoon,E., Kim,C.-K. SPIE-The International Society for Optical Engineering	7 国際会議録 Fabrication of micromirror supported by electroplated nickel posts Shin,J.-W., Chung,S.-W., Kim,Y.-K., Lee,E.-H., Choi,B.-G., Ahn,S.-J. SPIE-The International Society for Optical Engineering
2 国際会議録 Novel monolithic and multilevel integration of high-precision 3-D microfluidic components Yoon,J.-B., Han,C.-H., Yoon,E., Kim,C.-K. SPIE-The International Society for Optical Engineering	8 国際会議録 Realization of sub-80-nm small-space patterning in ArF photolithography Kim, S.-H., Kim, H.-D., Lee, S.-H., Park, C.-M., Ryoo, M.-H., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, … SPIE - The International Society of Optical Engineering
3 国際会議録 Novel two-step baking process for high-aspect-ratio photolithography with conventional positive thick photoresist Yoon,J.-B., Han,C.-H., Kim,C.-K. SPIE-The International Society for Optical Engineering	9 国際会議録 Fabrication of freestanding microstructures using UV lithography and double-electroplating technique Baek,C.-W., Kim,Y.-K. SPIE-The International Society for Optical Engineering
4 国際会議録 Fabrication of a Single Crystal Silicon Substrate for AM-LCD Using Vertical Etching of (110) Silicon Yoon, J.-B., Lee, H.-J., Han, C.-H., Kim, C.-K. MRS - Materials Research Society	10 国際会議録 Fabrication of Silk Microstructures using Photolithography Ramendra K. Pal, Nicholas E. Kurland, Subhas C. Kundu, Vamsi K. Yadavalli Materials Research Society
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6 国際会議録 Nanocrystals Formation and Microstructure Evolution of Amorphous Si and Si0 7Ge0.3 by Using Low Pressure Chemical Vapor Deposition Yoon, T.-S., Lee, D.-H., Koon, J.-K., Kim, K.B. Electrochemical Society	12 国際会議録 Effect of external phase modulation on suppression of stimulated Brillouin scattering in an optical transmission system using fiber lasers Lee, H.-Y., Han, Y.-T., Kim, J., Yang, W.-S., Lim, S.K., An, C., Yoon, H.D. SPIE-The International Society for Optical Engineering

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