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Novel two-step baking process for high-aspect-ratio photolithography with conventional positive thick photoresist

著者名:
  • Yoon,J.-B. ( Korea Advanced Institute of Science and Technology )
  • Han,C.-H. ( Korea Advanced Institute of Science and Technology )
  • Kim,C.-K. ( Korea Advanced Institute of Science and Technology )
掲載資料名:
Materials and Device Characterization in Micromachining
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3512
発行年:
1998
開始ページ:
316
終了ページ:
325
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429711 [0819429716]
言語:
英語
請求記号:
P63600/3512
資料種別:
国際会議録

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