Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications
- 著者名:
- Panepucci,R.R. ( Univ.de Campinas (Brazil) )
- Diniz,J.A. ( Univ.de Campinas (Brazil) )
- Carli,E. ( Univ.de Campinas (Brazil) )
- Tatschi,P.J. ( Univ.de Campinas (Brazil) )
- Swart,J.W. ( Univ.de Campinas (Brazil) )
- 掲載資料名:
- Materials and Device Characterization in Micromachining
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3512
- 発行年:
- 1998
- 開始ページ:
- 146
- 終了ページ:
- 151
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819429711 [0819429716]
- 言語:
- 英語
- 請求記号:
- P63600/3512
- 資料種別:
- 国際会議録
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