FORMAITION OF EPITAXIAL CoSi2 FILMS ON Si ( 111 ) A LOW TEMPERRATURE ( < 400。?)
- 著者名:
Haderbache L. Wetzel P. Pirri C. Peruchetti C. J. Bolmont D. Gewinner G. - 掲載資料名:
- Heterostructures on silicon : one step further with silicon
- シリーズ名:
- NATO ASI series. Series E, Applied sciences
- シリーズ巻号:
- 160
- 発行年:
- 1989
- 開始ページ:
- 223
- 終了ページ:
- 229
- 総ページ数:
- 7
- 出版情報:
- Dordrecht: Kluwer Academic Publishers
- ISSN:
- 0168132X
- ISBN:
- 9780792301240 [0792301242]
- 言語:
- 英語
- 請求記号:
- N11482/160
- 資料種別:
- 国際会議録
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2
国際会議録
ON THE CRITIAL LAYER THICKNESS OF STRAINED-LAYER HETERO-EPITAXIAL CoSi2 FILMS ONF < 111 > Si
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ARSENIC DIFFUSION AND SEGREGATION BEHAVIOR AT THE INTERFACE OF EPITAXIAL CoSi2 FILM AND Si SUBSTRATE
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Disorder and Strain Effects in the Optical Response of Thin CoSi Epitaxial Films on Si(111)
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