Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node

Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node

著者名:

Petersen,J.S. ( Petersen Advanced Lithography )

掲載資料名:

Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3741

発行年:

1999

開始ページ:

73

終了ページ:

89

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819432216 [0819432210]

言語:

英語

請求記号:

P63600/3741

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018088
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing Technologies : Lithography for Semiconductor Manufacturing
回次:	1999
会議開催地:	Edinburgh, Scotland
会議開催年:	1999.05.19-1999.05.21

類似資料:

1 国際会議録 Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node Petersen,J.S., McCallum,M., Kachwala,N., Socha,R.J., Chen,J.F., Laidig,T.L., Smith,B.W., Gordon,R.L., Mack,C.A. SPIE - The International Society for Optical Engineering	7 国際会議録 Binary halftone chromeless PSM technology for λ/4 optical lithography Chen,J.F., Petersen,J.S., Socha,R.J., Laidig,T.L., Wampler,K.E., Nakagawa,K.H., Hughes,G.P., MacDonald,S.S., Ng,W. SPIE-The International Society for Optical Engineering
2 国際会議録 Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography Petersen,J.S., Socha,R.J., Naderi,A.R., Baker,C.A., Rizvi,S.A., BanDenBroeke,D., Kachwala,N., Chen,F., Laiding,S., … SPIE-The International Society for Optical Engineering	8 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering
3 国際会議録 Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL) Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., Hsu, S.D., Wampler, K.E., Socha, R.J., Petersen, J.S. SPIE-The International Society for Optical Engineering	9 国際会議録 Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask Chen, J.F., Van Den Broeke, D.J., Hsu, M., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, S., Shafer, T. SPIE-The International Society for Optical Engineering
4 国際会議録 Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I Socha,R.J., Petersen,J.S., Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F. SPIE - The International Society for Optical Engineering	10 国際会議録 Imaging contrast improvement for 160-nm line features using subresolution assist features with binary,six percent ternary attenuated phase-shift mask with … Kachwala,N., Petersen,J.S., Chen,J.F., Canjemi,M., McCallum,M. SPIE - The International Society for Optical Engineering
5 国際会議録 Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node Van Den Broeke, D.J., Laidig, T.L., Chen, J.F., Wampler, K.E., Hsu, S.D., Shi, X., Socha, R.J., Dusa, M.V., Corcoran, … SPIE - The International Society of Optical Engineering	11 国際会議録 Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results Socha,R.J., Shi,X., Holman,K.C., Dusa,M.V., Conley,W., Petersen,J.S., Chen,J.F., Laidig,T.L., Wampler,K.E., … SPIE - The International Society for Optical Engineering
6 国際会議録 Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology Socha, R.J., Van Den Broeke, D.J., Yu, L., Conley, W., Wu, W., Chen, J.F., Petersen, J.S., Gerold, D.J., van Praagh, J., … SPIE-The International Society for Optical Engineering	12 国際会議録 Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12