193-nm lithography:new challenges,new worries
- 著者名:
- McCallum,M. ( SEMATECH(USA)and Motorola )
- Domke,W.-D.
- Byers,J.D.
- Stark,D.R.
- 掲載資料名:
- Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3741
- 発行年:
- 1999
- 開始ページ:
- 59
- 終了ページ:
- 65
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432216 [0819432210]
- 言語:
- 英語
- 請求記号:
- P63600/3741
- 資料種別:
- 国際会議録
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193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
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Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
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