Vacuum spark for soft x-rays and the spherical pinch for EUV as point sources for microlithography
- 著者名:
Wu,F.F. ( ALFT,Inc. ) Tang,W. Wirpszo,K.W. Guo,X. Xu,M. Semyonov,O. Huang,C. Klibanov,L. Panarella,E. - 掲載資料名:
- Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3997
- 発行年:
- 2000
- 開始ページ:
- 740
- 終了ページ:
- 750
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436153 [0819436151]
- 言語:
- 英語
- 請求記号:
- P63600/3997
- 資料種別:
- 国際会議録
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9
国際会議録
Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |