Photoresist film thickness for extreme ultraviolet lithography

Photoresist film thickness for extreme ultraviolet lithography

著者名:

Dentinger,P.M. ( Sandia National Labs. )
Cardinale,G.F.
Henderson,C.C.
Fisher,A.
Ray-Chaudhuri,A.K.

掲載資料名:

Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3997

発行年:

2000

開始ページ:

588

終了ページ:

599

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436153 [0819436151]

言語:

英語

請求記号:

P63600/3997

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018055
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	2000 : 4th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.02.28-2000.03.01

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