Step and flash imprint lithography for sub-100-nm patterning

Step and flash imprint lithography for sub-100-nm patterning

著者名:

Colburn,M. ( Univ.of Texas at Austin )

掲載資料名:

Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3997

発行年:

2000

開始ページ:

453

終了ページ:

457

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436153 [0819436151]

言語:

英語

請求記号:

P63600/3997

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018055
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	2000 : 4th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.02.28-2000.03.01

類似資料:

1 国際会議録 Step and flash imprint lithography:a new approach to high-resolution patterning Colburn,M., Johnson,S., Stewart,M., Damle,S., Bailey,T.C., Choi,B., Wedlake,M., Michaelson,T., Sreenivasan,S.V., … SPIE - The International Society for Optical Engineering	7 国際会議録 Cost of ownership analysis for patterning using step and flash imprint lithography Sreenivasan, S.V., Willson, C.G., Schumaker, N.E., Resnick, D.J. SPIE-The International Society for Optical Engineering
2 国際会議録 Layer-to-layer alignment for step and flash imprint lithography Choi,B.J., Meissl,M.J., Colbrun,M., Bailey,T.C., Ruchhoeft,P., Sreenivasan,S.V., Prins,F., Banerjee,S.K., Ekerdt,J.G., … SPIE-The International Society for Optical Engineering	8 国際会議録 Low-cost nanostructure patterning using step and flash imprint lithography Sreenivasan, S.V., Willson, C.G., Schumaker, N.E., Resnick, D.J. SPIE-The International Society for Optical Engineering
3 国際会議録 New methods for fabricating step and flash imprint lithography templates Resnick, D.J., Bailey, T.C., Mancini, D.P., Nordquist, K.J., Dauksher, W.J., Ainley, E.S., Talin, A., Gehoski, K.A., … SPIE-The International Society for Optical Engineering	9 国際会議録 Development of imprint materials for the Step and Flash Imprint Lithography process Xu, F., Stacey, N.A., Watts, M., Truskett, V., McMackin, I., Choi, J., Schumaker, P., Thompson, E., Babbs, D., … SPIE - The International Society of Optical Engineering
4 国際会議録 High-resolution templates for step and flash imprint lithography Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Ainley, E.S., Gehoski, K.A., Baker, J.H., Bailey, T.C., … SPIE-The International Society for Optical Engineering	10 国際会議録 Imprint lithography: lab curiosity or the real NGL (Keynote Address) Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Bailey, T.C., Johnson, S.C., Stacey, N.A., Ekerdt, J.G., … SPIE-The International Society for Optical Engineering
5 国際会議録 Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device Smith, B.J., Stacey, N.A., Donnelly, J.P., Onsongo, D.M., Bailey, T.C., Mackay, C.J., Resnick, D.J., Dauksher, W.J., … SPIE-The International Society for Optical Engineering	11 国際会議録 Partially Constrained Compliant Stages for High Resolution Imprint Lithography B. J. Choi, S. Johnson, S. V. Sreenivasan, M. Colburn, T. Bailey, C. G. Willson American Society of Mechanical Engineers
6 国際会議録 Advances in Step and Flash imprint lithography Johnson, S.C., Bailey, T.C., Dickey, M.D., Smith, B.J., Kim, E.K., Jamieson, A.T., Stacey, N.A., Ekerdt, J.G., Willson, … SPIE-The International Society for Optical Engineering	12 国際会議録 Whole wafer imprint patterning using step and flash imprint lithography: a manufacturing solution for sub-100-nm patterning D. Lentz, G. Doyle, M. Miller, G. Schmidt, M. Ganapathisuramanian, X. Lu, D. Resnick, D. L. LaBrake SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12