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AN EFFECTIVE IN-SITU O2 HIGH DENSITY PLASMA CLEAN

著者名:
Reinhardt, K.
Divincenzo, B.
Yang, C.-L.
Arleo, P.
Marks, J.
Mikulan, P.
Gu, T.
Fonash, S.
さらに 3 件
掲載資料名:
Surface chemical cleaning and passivation for semiconductor processing
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
315
発行年:
1993
開始ページ:
267
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
言語:
英語
請求記号:
M23500/315
資料種別:
国際会議録

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