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HYDROGEN PLASMA CLEANING OF THE Si(100) SURFACE: REMOVAL OF OXYGEN AND CARBON AND THE ETCHING OF Si

著者名:
Kinosky, David
Qian, R.
Mahajan, A.
Thomas, S.
Munguia, P.
Fretwell, J.
Banerjee, S.
Tasch, A.
さらに 3 件
掲載資料名:
Surface chemical cleaning and passivation for semiconductor processing
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
315
発行年:
1993
開始ページ:
219
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
言語:
英語
請求記号:
M23500/315
資料種別:
国際会議録

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