GaN Etching in BCl3/Cl2 Plasmas
- 著者名:
Shul, R. J. Ashby, C. I. H. Willison, C. G. Zhang, L. Han, J. Bridges, M. M. Pearton, S. J. Lee, J. W. Lester, L. F. - 掲載資料名:
- Wide-bandgap semiconductors for high power, high frequency, and high temperature : symposium held April 13-15, 1998, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 512
- 発行年:
- 1998
- 開始ページ:
- 487
- 出版情報:
- Warrendale, Penn.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994188 [1558994181]
- 言語:
- 英語
- 請求記号:
- M23500/512
- 資料種別:
- 国際会議録
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10
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In Situ Monitoring of Etch Byproducts During Reactive Ion Beam Etching of GaAs in Chlorine/Argon
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