Low-Temperature GaN Growth of Nitridated Sapphire Using Remote Plasma-Enhanced Ultrahigh Vacuum Chemical Vapor Deposition

Low-Temperature GaN Growth of Nitridated Sapphire Using Remote Plasma-Enhanced Ultrahigh Vacuum Chemical Vapor Deposition

著者名:

Kim, Dong-Jun

掲載資料名:

Nitride semiconductors : symposium held December 1-5, 1997, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

482

発行年:

1998

開始ページ:

161

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993877 [1558993878]

言語:

英語

請求記号:

M23500/482

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017994
シリーズID:	PA00000011
会議名:	Symposium on nitride semiconductors
回次:	1997
会議開催地:	Boston, MA, USA
会議開催年:	1997.12.01-1997.12.05

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