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RTA Processing of W-Polycide Dual-Gate Sub-Micron Structures for Low-Voltage CMOS Technology

著者名:
Bevk, J.
Furtsch, M.
Georgiou, G. E.
Hillenius, S. J.
Schielein, D.
Schiml, T.
Silverman, P. J.
Luftman, H. S.
さらに 3 件
掲載資料名:
Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
429
発行年:
1996
開始ページ:
115
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993327 [1558993320]
言語:
英語
請求記号:
M23500/429
資料種別:
国際会議録

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