KINETICS OF REACTIVE ION ETCHING OF POLYMERS IN AN OXYGEN PLASMA: THE IMPORTANCE OF DIRECT REACTIVE ION ETCHING

KINETICS OF REACTIVE ION ETCHING OF POLYMERS IN AN OXYGEN PLASMA: THE IMPORTANCE OF DIRECT REACTIVE ION ETCHING

著者名:

掲載資料名:

Gas-phase and surface chemistry in electronic materials processing : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

334

発行年:

1994

開始ページ:

433

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992337 [1558992332]

言語:

英語

請求記号:

M23500/334

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017981
シリーズID:	PA00000011
会議名:	Symposium on gas-phase and surface chemistry in electronic materials processing
回次:	1993
会議開催地:	Boston, MA, USA
会議開催年:	1993.11.29-1993.12.02

類似資料:

1 国際会議録 MECHANISM OF REACTIVE ION ETCHING OF POLYMERIC FILMS IN OXYGEN-BASED PLASMAS Graham, Sandra W., Steinbruchel, Christoph Materials Research Society	7 国際会議録 A Study of Electrochemically Deposited Copper on PVD Copper and TiN Using a Cu-EDTA Complexed Bath Graham, Lyndon, Steinbruchel, Christoph, Duquette, David J. Electrochemical Society
2 国際会議録 MECHANISM OF DRY ETCHING OF SILICON DIOXIDE: A CASE OF DIRECT REACTIVE ION ETCHING Steinbruchel, Ch., Lehmann, H. W., Frick, K. Materials Research Society	8 国際会議録 Effect of Oxygen and Nitrogen Additions on Silicon Nitride Reactive Ion Etching in Fluorine Containing Plasmas Reyes-Betanzo, C., Moshkalyov, S.A., Ramos, A.C.S., Cotta, M.A., Swart, J.W. Electrochemical Society
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4 国際会議録 REACTIVE ION ETCHING OF COPPER WITH SiCl4 AND CCl2F2 Howard, B.J., Wolterman, S.K., Yoo, W.J., Gittleman, B., Steinbruchel, Ch. Materials Research Society	10 国際会議録 SURFACE MORPHOLOGICAL CHANGES OF POLYIMIDE WITH OXYGEN REACTIVE ION BEAM ETCHING (RIBE) Paik, K.W., Ruoff, A.L. Materials Research Society
5 国際会議録 PHYSICAL AND CHEMICAL SPUTTERING AT VERY LOW ION ENERGY: THE IMPORTANCE OF THE SPUTTERING THRESHOLD Steinbruchel, C. Materials Research Society	11 国際会議録 OXYGEN REACTIVE ION BEAM ETCHING ON POLYIMIDE TO ENHANCE COPPER FILM ADHESION Paik, Kyung W., Ruoff, Arthur L. Materials Research Society
6 国際会議録 HARDNESS AND TRIBOLOGICAL EFFECTS OF ION IMPLANTATION ON ELECTROPLATED CHROMIUM Noll, Kathryn E., Steinbruchel, Christoph MRS - Materials Research Society	12 国際会議録 THE IMPORTANCE OF SELF-SPUTTERING BY LOW ENERGY IONS IN PARTIALLY IONIZED BEAM DEPOSITION Bai, P., Steinbruchel, Ch., Lu, T.-M. Materials Research Society

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