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CHARACTERIZATION OF SILICON-NITRIDE FILM GROWTH BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION (PRECVD)

著者名:
掲載資料名:
Gas-phase and surface chemistry in electronic materials processing : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
334
発行年:
1994
開始ページ:
341
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992337 [1558992332]
言語:
英語
請求記号:
M23500/334
資料種別:
国際会議録

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