Evaluation of light resistance of pellicle membrane in the environment with solvent
- 著者名:
- Shirasaki,T. ( Shin-Etsu Chemical Co.,Ltd. )
- Kashida,M.
- Kubota,Y.
- 掲載資料名:
- Photomask and X-Ray Mask Technology III
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2793
- 発行年:
- 1996
- 開始ページ:
- 387
- 終了ページ:
- 395
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- 言語:
- 英語
- 請求記号:
- P63600/2793
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
Trans Tech Publications |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Plastics Engineers |