Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure
- 著者名:
Hong,S. ( Korea Advanced Institute of Science and Technology ) Kim,E. Jiang,Z.-T. Bae,B.-S. No,K. Shin,W. Lim,S.-C. Woo,S.-G. Koh,Y.-B. - 掲載資料名:
- Photomask and X-Ray Mask Technology III
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2793
- 発行年:
- 1996
- 開始ページ:
- 134
- 終了ページ:
- 137
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- 言語:
- 英語
- 請求記号:
- P63600/2793
- 資料種別:
- 国際会議録
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5
国際会議録
Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |