Resolution enhancement with thin Cr for chrome mask making

Resolution enhancement with thin Cr for chrome mask making

著者名:

Cha,B.C. ( Samsung Electronics Co.,Ltd. )
Choi,S.W.
Kim,J.M.
Cho,H.J.
Sohn,J.M.

掲載資料名:

Photomask and X-Ray Mask Technology III

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2793

発行年:

1996

開始ページ:

53

終了ページ:

61

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421791 [0819421790]

言語:

英語

請求記号:

P63600/2793

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017954
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1996 : 3rd
会議開催地:	Kawasaki City, Kanagawa, Japan
会議開催年:	1996.04.18-1996.04.19

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2 国際会議録 Comparative study on MEEF and dose latitude between attenuated PSM and Cr Binary masks Cho,H.-J., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering	8 国際会議録 Correction method for radial effect caused by spin process Kim,J.-M., Choi,S.-W., Cha,B.-C., Yoon,H.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
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4 国際会議録 Current status of mask CD uniformity as related to e-beam system Lim,S.-C., Kim,B.-G., Choi,S.-W., Lee,K.-H., Cho,H.-J., Yu,Y.-H., Cho,H.-K., Sohn,J.-M. SPIE-The International Society for Optical Engineering	10 国際会議録 EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering
5 国際会議録 Vacuum delay effect of CAR in mask fabrication Kim,C.-H., Jeon,C.-U., Han,S.-J., Cho,W.-I., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	11 国際会議録 A novel focus monitoring method using double side chrome mask Cha, B.-C., Kim, Y.-H., Yoon, H.-S., Han, W.-S. SPIE - The International Society of Optical Engineering
6 国際会議録 Analysis of dry etch loading effect in mask fabrication Lee,J.-Y., Cho,S.-Y., Kim,C.-H., Lee,S.-W., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	12 国際会議録 Evaluation of the practical use of GHOST technique for various e-beam resists Cha,B.-C., Kim,J.-M., Kim,B.-G., Choi,S.-W., Yoon,H.-S., Sohn,J.-M. SPIE - The International Society for Optical Engineering

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