TEM and in situ HREM for Studying Metal-Semiconductor Interfacial Reactions

TEM and in situ HREM for Studying Metal-Semiconductor Interfacial Reactions

著者名:

掲載資料名:

Reactive phase formation at interfaces and diffusion processes : proceedings of the International Meeting held in Aussois (France), May 21 - 28, 1993

シリーズ名:

Materials science forum

シリーズ巻号:

155-156

発行年:

1994

開始ページ:

111

終了ページ:

120

出版情報:

Aedermannsdorf: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878496808 [0878496807]

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017900
シリーズID:	PA00000012
会議名:	Reactive Phase Formation at Interfaces and Diffusion Processes : International Meeting
回次:	1993
会議開催地:	Aussois, France
会議開催年:	1993.05.21-1993.05.28

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2 国際会議録 IN-SITU TEM OBSERVATION OF INTERFACIAL REACTIONS IN THE Zr/Si SYSTEM Tanaka, Hiroyuki, Konno, Toyohiko J., Sinclair, Robert MRS - Materials Research Society	8 国際会議録 Application of In Situ HREM to Study Crystallization in Materials Sinclair, R., Min, K. H., Kwon, U. Trans Tech Publications
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