Blank Cover Image

Low-reflectivity materials for the vacuum UV: Mg and Ag surfaces

著者名:
  • Moldosanov,K.A. ( Special Design Office OKB Aalam (Kyrgyzstan) and Institute of Physics (Kyrgyzstan) )
  • Samsonov,M.A. ( Institute of Physics (Kyrgyzstan) )
  • Kim,L. S. ( Institute of Physics (Kyrgyzstan) )
  • Henneck,R. ( Paul-Scherrer-Institut (Switzerland) )
掲載資料名:
EUV, X-ray, and gamma-ray instrumentation for astronomy VIII : 30 July - 1 August 1997, San Diego, California, Oswald H. W. Siegmund, Mark A. Gummin, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3114
発行年:
1997
開始ページ:
652
終了ページ:
656
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819425362 [0819425362]
言語:
英語
請求記号:
P63600/3114
資料種別:
国際会議録

類似資料:

1 国際会議録 Reflectivities of light-absorptive coatings within visible-wavelength range

Moldosanov,K.A., Henneck,R., Skyrnnikov,A.M., Kashirin,V.A., Makarov,V.P., Kobtsov,G.A., Samsonov,M.A., Kim,L.S.

SPIE-The International Society for Optical Engineering
7 国際会議録 Optimization of optical properties of silicon-based anti-reflective spin-on hardmask materials

S. K. Kim, H. M. Cho, C. Woo, S. R. Koh, M. Kim

Society of Photo-optical Instrumentation Engineers
2 国際会議録 121.6-nm stray light reduction methods for solar wind characterization instruments

Moldosanov, K.A., Henneck, R., Samsonov, M.A., Siegmund, O.H.W., Zastenker, G.N.

SPIE-The International Society for Optical Engineering
8 国際会議録 Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography

S. K. Kim, H. M. Cho, S. R. Koh, M. Kim, H. C. Yoon

Society of Photo-optical Instrumentation Engineers
3 国際会議録 Reflectivity of black-chromium coating at a wavelength of 121 .6 nm

Moldosanov,K.A.

SPIE - The International Society for Optical Engineering
9 国際会議録 Silicon-based anti-reflective spin-on hardmask materials with improved storage stability for 193-nm lithography

S. K. Kim, S. H. Lim, D. Kim, S. R. Koh, M. Kim, H. C. Yoon, D. S. Uh, J. S. Kim, T. Chang

SPIE - The International Society of Optical Engineering
4 国際会議録 Reflectivity of Al coating sputtered by using the nitrogen-containing plasma

Moldosanov,K.A., Anisimov,V.P., Anisimova,I.A., Skrynnikov,A.M., Kashirin,V.A.

SPIE-The International Society for Optical Engineering
10 国際会議録 Transmission of thin indium filters in the EUV and lifetime tests

Henneck,R., Bjorknas,K., Jelinsky,S. R.

SPIE-The International Society for Optical Engineering
5 国際会議録 Reflectivity of the Al-Cr stray-light-absorptive coating

Anisimov, V.P., Anisimova, I.A., Moldosanov, K.A., Skrynnikov, A.M., Kashirin, V.A.

SPIE-The International Society for Optical Engineering
11 国際会議録 Low resistance and high reflectivity Al based reflectors for p-GaN flip process

S. W. Chae, K. Y. Ko, D. W. Kim, S. M. Hwang, H. J. Park, J. W. Kim, Y. C. Kim

SPIE - The International Society of Optical Engineering
6 国際会議録 Reflectivity of the AI-N coating: results of mechanical and environmental tests

Anisimov, V.P., Anisimova, I.A., Kashirin, V.A., Moldosanov, K.A., Skrynnikov, A.M.

SPIE-The International Society for Optical Engineering
12 国際会議録 Mg-doped Al-rich AlGaN alloys for deep UV emitters

Nakarmi, M. L., Kim, K. H., Zhu, K., Lin, J. Y., Jiang, H. X.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12