Analysis on the metal etch resist selectivity measurement

Analysis on the metal etch resist selectivity measurement

著者名:

Premachandran,V. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Joy,R. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Ho,P.K.K. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Lok,L.W. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Schulke,T. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Tsai,Y. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

さらに 1 件

掲載資料名:

Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3213

発行年:

1997

開始ページ:

147

終了ページ:

155

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426451 [0819426458]

言語:

英語

請求記号:

P63600/3213

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017866
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Process, Equipment, and Materials Control in Integrated Circuit Manufacturing
回次:	1997 : 3rd
会議開催地:	Austin, TX, USA
会議開催年:	1997.10.01-1997.10.02

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