Modeling of OES data to estimate etch rate for etching equipment (Invited Paper)

Modeling of OES data to estimate etch rate for etching equipment (Invited Paper)

著者名:

Cheng,Y. ( Univ.of Texas at Austin )

Markie,R. ( Advanced Micro Devices,Inc. )

Qin,J. ( Univ.of Texas at Austin )

Edgar,T.F. ( Univ.of Texas at Austin )

Gatto,M.J. ( Advanced Micro Devices,Inc. )

Nauert,C. ( Advanced Micro Devices,Inc. )

さらに 1 件

掲載資料名:

Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3213

発行年:

1997

開始ページ:

108

終了ページ:

118

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426451 [0819426458]

言語:

英語

請求記号:

P63600/3213

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017866
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Process, Equipment, and Materials Control in Integrated Circuit Manufacturing
回次:	1997 : 3rd
会議開催地:	Austin, TX, USA
会議開催年:	1997.10.01-1997.10.02

類似資料:

1 国際会議録 Modeling of Plasma Etch Dynamics Using Linear and Nonlinear Models Bushman, S., Karijala, T.W., Himmelblau, D.M., Trachtenberg, I., Edgar, T.F. Electrochemical Society	7 国際会議録 Model-Based Control of Rapid Thermal Processes Stuber, J.D., Edgar, T.F., Brecdijk, T. Electrochemical Society
2 国際会議録 Optimizing process and equipment efficiency using integrated methods D'Elia,M.J., Alfonso,T.F. SPIE-The International Society for Optical Engineering	8 国際会議録 Photonic crystals for light-emitting devices (Invited Paper) Krauss,T.F., Labilloy,D., Scherer,A., De La Rue,R.M. SPIE-The International Society for Optical Engineering
3 国際会議録 Magnetic-field enhancemant of terahertz emission from semiconductor surfaces: a comparison of experiment with semiclassical model(Invited Paper) Shan, J., Weiss, C., Wallenstein, R.E., Beigang, R., Heinz, T.F. SPIE-The International Society for Optical Engineering	9 国際会議録 ARTIFICIAL NEURAL NETWORK MODEL OF PLASMA ETCHING Hoskins, Josiah C., McLaughlin, Kevin J., Himmelblau, David M., Edgar, Thomas F. American Institute of Chemical Engineers
4 国際会議録 Process Control of Plasma Etch Systems Bushman, S., Edgar, T.F., Trachtenberg, I. Electrochemical Society	10 国際会議録 MODELING OF THE SILANE SURFACE REACTION INT THE CHEMICAL VAPOR DEPOSITION OF POLYSILICON IN A COLD WALL RAPID THERMAL SYSTEM Toprac, A.J., Trachtenberg, I., Edgar, T.F. Electrochemical Society
5 国際会議録 Process Monitoring of Plasma Etch Systems Bushman, S., Edgar, T.F., Trachtenberg, I., Wiiliams, N. American Institute of Chemical Engineers	11 国際会議録 Ultrafast measurements of electric fields in semiconductors by optical harmonic generation (Invited Paper) Nahata,A., Heinz,T.F., Misewich,J.A. SPIE-The International Society for Optical Engineering
6 国際会議録 Radio frequency diagnostics for plasma etch systems S. Bushman, T.F. Edgar, I. Trachtenberg, N. Williams Society of Photo-optical Instrumentation Engineers	12 国際会議録 Etch resistance: comparison and development of etch rate models D. Perret, C. E. Andes, K. Cheon, M. Sobhian, C. R. Szmanda, G. G. Barclay, P. Trefonas SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12