Design of illumination system for ArF excimer laser step-and-scanner
- 著者名:
Lee,K.H. ( Electronics and Telecommunications Research Institute (Korea) ) Kim,D.H. ( Electronics and Telecommunications Research Institute (Korea) ) Kim,J.S. ( Electronics and Telecommunications Research Institute (Korea) ) Choi,S.-S. ( Electronics and Telecommunications Research Institute (Korea) ) Chung,H.B. ( Electronics and Telecommunications Research Institute (Korea) ) Yoo,H.J. ( Electronics and Telecommunications Research Institute (Korea) ) Kim,B.W. ( Electronics and Telecommunications Research Institute (Korea) ) - 掲載資料名:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3334
- 発行年:
- 1998
- 開始ページ:
- 997
- 終了ページ:
- 1004
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- 言語:
- 英語
- 請求記号:
- P63600/3334
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Haze acceleration system for photo mask application by using high repetition ArF excimer laser
Society of Photo-optical Instrumentation Engineers |
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Trans Tech Publications |