Chromatic aberration-free TTL alignment system for 193-nm step-and-scan exposure system by using phase conjugate waves
- 著者名:
- Kwon,J.H. ( Yeungnam Univ.(Korea) )
- Sohn,Y.J. ( Yeungnam Univ.(Korea) )
- Hwang,H.C. ( Yeungnam Univ.(Korea) )
- Kim,D.H. ( Electronics and Telecommunications Research Institute (Korea) )
- Chung,H.B. ( Electronics and Telecommunications Research Institute (Korea) )
- 掲載資料名:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3334
- 発行年:
- 1998
- 開始ページ:
- 971
- 終了ページ:
- 977
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- 言語:
- 英語
- 請求記号:
- P63600/3334
- 資料種別:
- 国際会議録
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