Optimal proximity correction: application for flash memory design
- 著者名:
Chen,Y.G. ( Mosel Vitelic Corp. (Taiwan) ) Huang,D.L. ( Mosel Vitelic Corp. (Taiwan) ) Sung,K.T. ( Mosel Vitelic Corp. (Taiwan) ) Chiang,J.J. ( Mosel Vitelic Corp. (Taiwan) ) Yu,M. ( Mosel Vitelic Corp. (Taiwan) ) Teng,F. ( Mosel Vitelic Corp. (Taiwan) ) Chu,L. ( Technology Modeling Associates,Inc. ) Rey,J.C. ( Technology Modeling Associates,Inc. ) Bernard,D.A. ( Technology Modeling Associates,Inc. ) Li,J. ( Technology Modeling Associates,Inc. ) Moroz,V. ( Technology Modeling Associates,Inc. ) Boksha,V.V. ( Technology Modeling Associates,Inc. ) - 掲載資料名:
- Optical microlithography XI : 25-27 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3334
- 発行年:
- 1998
- 開始ページ:
- 874
- 終了ページ:
- 884
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427793 [0819427799]
- 言語:
- 英語
- 請求記号:
- P63600/3334
- 資料種別:
- 国際会議録
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