Optimization of ARC process in DUV lithography

Optimization of ARC process in DUV lithography

著者名:

Shim,K.-J. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
Choi,B.-I. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
Park,K.-Y. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
Lee,W.-G. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )

掲載資料名:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3334

発行年:

1998

開始ページ:

692

終了ページ:

701

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

言語:

英語

請求記号:

P63600/3334

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017855
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1998 : 11th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.25-1998.02.27

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