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CD control for quarter-micron logic device gates using iso-pitch bias

著者名:
Kim,Y.-C. ( Samsung Electronics Co.,Ltd. (Korea) )
Yeo,G.-S. ( Samsung Electronics Co.,Ltd. (Korea) )
Shin,H.-S. ( Samsung Electronics Co.,Ltd. (Korea) )
Kim,H. ( Samsung Electronics Co.,Ltd. (Korea) )
Kang,H.-Y. ( Samsung Electronics Co.,Ltd. (Korea) )
Chung,U-I. ( Samsung Electronics Co.,Ltd. (Korea) )
さらに 1 件
掲載資料名:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3334
発行年:
1998
開始ページ:
629
終了ページ:
639
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
言語:
英語
請求記号:
P63600/3334
資料種別:
国際会議録

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