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Optimization of DUV photolithography for sub-250-nm technology: contact patterning with attenuated phase-shift mask

著者名:
  • Choo,L.-C. ( Nanyang Technological Univ.(Singapore) )
  • Tam,S.-C. ( Nanyang Technological Univ.(Singapore) )
  • Cheng,A. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Ho,I.C. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
掲載資料名:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3334
発行年:
1998
開始ページ:
559
終了ページ:
566
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
言語:
英語
請求記号:
P63600/3334
資料種別:
国際会議録

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