Deep-UV reflection control for patterning dielectric layers

Deep-UV reflection control for patterning dielectric layers

著者名:

Subramanian,R. ( Advanced Micro Devices,Inc. )
Bains,G.S. ( Advanced Micro Devices,Inc. )
Lyons,C.F. ( Advanced Micro Devices,Inc. )
Singh,B. ( Advanced Micro Devices,Inc. )
Gallardo,E. ( Advanced Micro Devices,Inc. )

掲載資料名:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3334

発行年:

1998

開始ページ:

356

終了ページ:

370

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

言語:

英語

請求記号:

P63600/3334

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017855
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1998 : 11th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.25-1998.02.27

類似資料:

1 国際会議録 Improved resist profiles and CD control through optimized thin dielectric stacks C.F. Lyons, M. Agrawal, B. Singh Society of Photo-optical Instrumentation Engineers	7 国際会議録 UV irradiance patterns in Italy Meloni D., Casale R. G., Siani M. A., Palmieri S., Cappelliani F. Kluwer
2 国際会議録 Process control and optimization of conventional metal process for 0.18-ｦﾌm logic technology Subramanian,R., Brown,S.E., Chen,S.H., Morales,C., Gallardo,E., Singh,B. SPIE - The International Society for Optical Engineering	8 国際会議録 Noise immunity and pattern discrimination using wavelet feature-based generalized fringe-adjusted joint transform correlator Tripathi,R., Pati,G.S., Singh,K. SPIE - The International Society for Optical Engineering
3 国際会議録 Sub-100-nm and deep sub-100-nm MOS transistor gate patterning Xiang,Q., Gupta,S., Spence,C.A., Singh,B., Yeap,G.C.-F., Lin,M.-R. SPIE-The International Society for Optical Engineering	9 国際会議録 Wavelet-assisted generalized fringe-adjusted non-zero-order joint transform correlator for noise immunity and pattern discrimination Tripathi,R., Pati,G.S., Singh,K. SPIE - The International Society for Optical Engineering
4 国際会議録 Effect of real masks on wafer patterning Spence,C.A., Subramanian,R., Teng,D., Gallardo,E. SPIE - The International Society for Optical Engineering	10 国際会議録 Dielectric behaviour of freezing n-decane and n- pentadecane Scaife, W. G. S., Lyons, C. C. R. North-Holland
5 国際会議録 Extending the limits of i-line lithography for via layers and minimization of dense-iso bias Subramanian,R., Spence,C.A., Capodieci,L., Werner,T., Gallardo,E. SPIE - The International Society for Optical Engineering	11 国際会議録 UV-patterned polymide surfaces: Characterization by Atomic Force Microscopy (AFM) Blach, J.A., Watson, G.S., Brown, C.L., Suzuki, T., Myhra, S. SPIE-The International Society for Optical Engineering
6 国際会議録 Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation M. Plat, W.R. Brunsvold, R.S. Smith, N.K. Eib, C.F. Lyons Society of Photo-optical Instrumentation Engineers	12 国際会議録 Characteristic study of electron beam stabilization for deep-UV photoresists Kim,M.-S., Choi,J.-H., Rho,C.-H., Hong,M.-J., Jun,B.-J., Gil,M.-G., Kim,B.-H., Ahn,D.-J., Ross,M.F., Wong,S.S. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12