Reduction of mask-induced CD errors by optical proximity correction

Reduction of mask-induced CD errors by optical proximity correction

著者名:

Randall,J. ( Texas Instruments and IMEC (Belgium) )
Tritchkov,A. ( IMEC (Belgium) )
Jonckheere,R. ( IMEC (Belgium) )
Jaenen,P. ( IMEC (Belgium) )
Ronse,K. ( IMEC (Belgium) )

掲載資料名:

Optical microlithography XI : 25-27 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3334

発行年:

1998

開始ページ:

124

終了ページ:

130

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427793 [0819427799]

言語:

英語

請求記号:

P63600/3334

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017855
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1998 : 11th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.25-1998.02.27

類似資料:

1 国際会議録 Top-surface imaging and optical proximity correction:a way to 0.18-ｦﾌm lithography at 248 nm Goethals,A.M., Vertommen,J., Roey,F.Van, Yen,A., Tritchkov,A., Ronse,K., Jonckheere,R., hove,L.Van den SPIE-The International Society for Optical Engineering	7 国際会議録 New approach to optical proximity correction Rosenbusch,A., Juffermans,A.H., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., Simecek,M., … SPIE - The International Society for Optical Engineering
2 国際会議録 Optical proximity effects and correction strategies for chemical-amplified DUV resists Beeck,M.Op de, Bruggeman,B., Botermans,H., Driessche,V.Van, Yen,A., Tritchkov,A., Jonckheere,R., Ronse,K., hove,L.Van … SPIE-The International Society for Optical Engineering	8 国際会議録 Hierarchical e-beam proximity correction in mask making Hofmann,U., Kalus,C.K., Rosenbusch,A., Jonckheere,R., Hourd,A.C. SPIE-The International Society for Optical Engineering
3 国際会議録 Some challenges for mask making to keep up with the roadmap Jonckheere,R., Randall,J.N., Marschner,T., Ronse,K. SPIE - The International Society for Optical Engineering	9 国際会議録 (Sub-) 100-nm gate patterning using 248-nm alternating PSM Vandenberghe,G.N., Jaenen,P., Jonckheere,R.M., Ronse,K., Toublan,O. SPIE-The International Society for Optical Engineering
4 国際会議録 Automated OPC for application in advanced lithography(Invited Paper) Ronse,K., Tritchkov,A., Randall,J., Jonckheere,R., Ghandehari,K., Van den hove,L. SPIE-The International Society for Optical Engineering	10 国際会議録 Application of a new approach to optical proximity correction Rosenbusch,A., Hourd,A.C., Juffermans,C.A., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., … SPIE - The International Society for Optical Engineering
5 国際会議録 Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process Palmer,S.R., Mason,M.E., Randall,J.N., Aton,T., Kim,K., Tritchkov,A.V., Burdorf,J., Rieger,M.L., Stirniman,J.P. SPIE-The International Society for Optical Engineering	11 国際会議録 Feature proximity errors on mask: assessment results of commercially obtained reticles Jonckheere, R.M., Potoms, G., Philipsen, V. SPIE-The International Society for Optical Engineering
6 国際会議録 Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography Tritchkov,A., Rieger,M.L., Stirniman,J.P., Yen,A., Ronse,K., Vandenberghe,G., hove,L.Van den SPIE-The International Society for Optical Engineering	12 国際会議録 Effect of reticle CD uniformity on wafer CD uniformity in the presence of scattering-bar optical proximity correction Adam,K., Socha,R.J., Dusa,M.V., Neureuther,A.R. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12