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Evaluation of phase-edge phase-shifting mask for sub-0.18-ｦﾌm gate patterns in logic devices

著者名:
Cha,D.-H. ( Samsung Electronics Co.,Ltd. (Korea) )
Kye,J.-W. ( Samsung Electronics Co.,Ltd. (Korea) )
Seong,N.-G. ( Samsung Electronics Co.,Ltd. (Korea) )
Kang,H.-Y. ( Samsung Electronics Co.,Ltd. (Korea) )
Cho,H.-K. ( Samsung Electronics Co.,Ltd. (Korea) )
Moon,J.-T. ( Samsung Electronics Co.,Ltd. (Korea) )
さらに 1 件
掲載資料名:
Optical microlithography XI : 25-27 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3334
発行年:
1998
開始ページ:
46
終了ページ:
54
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427793 [0819427799]
言語:
英語
請求記号:
P63600/3334
資料種別:
国際会議録

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