Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks

Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks

著者名:

Raphaelian,M.L. ( Micrion Corp. (USA) )
Casey,J.d. ( Micrion Corp. (USA) )
Doyle,A.F. ( Micrion Corp. (USA) )
Ferranti,D.C. ( Micrion Corp. (USA) )
Morgan,J.C. ( Micrion Corp. (USA) )

掲載資料名:

Photomask and X-Ray Mask Technology V

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3412

発行年:

1998

開始ページ:

589

終了ページ:

600

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819428646 [0819428647]

言語:

英語

請求記号:

P63600/3412

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017848
シリーズID:	PA00000029
会議名:	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
回次:	1998 : 5th
会議開催地:	Kawasaki, Japan
会議開催年:	1998.04.09-1998.04.10

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