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Ion projection lithography (Invited Paper)

著者名:
Melngailis,J. ( Univ.of Maryland/College Park (USA) )
Loschner,H. ( Ion Microfabrication Systems GmbH (Austria) )
Stengl,G. ( Ion Microfabrication Systems GmbH (Austria) )
Berry,I.L. ( Microelectronics Research Lab. (USA) )
Mondelli,A.A. ( Science Applications International Corp. (USA) )
Gross,G. ( Siemens AG (Germany) )
さらに 1 件
掲載資料名:
Photomask and X-Ray Mask Technology V
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3412
発行年:
1998
開始ページ:
369
終了ページ:
384
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
言語:
英語
請求記号:
P63600/3412
資料種別:
国際会議録

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