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Development of a high-performance e-beam resist suitable for advanced mask fabrication

著者名:
Tamura,K. ( Toray Industries,Inc. (Japan) )
Niwa,H. ( Toray Industries,Inc. (Japan) )
Kanetsuki,S. ( Toray Industries,Inc. (Japan) )
Asani,M. ( Toray Industries,Inc. (Japan) )
Mitamura,S. ( Dai Nippon Printing Co.,Ltd. (Japan) )
Okuno,D. ( Dai Nippon Printing Co.,Ltd. (Japan) )
Kurihara,M. ( Dai Nippon Printing Co.,Ltd. (Japan) )
Hayshi,N. ( Dai Nippon Printing Co.,Ltd. (Japan) )
さらに 3 件
掲載資料名:
Photomask and X-Ray Mask Technology V
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3412
発行年:
1998
開始ページ:
237
終了ページ:
245
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819428646 [0819428647]
言語:
英語
請求記号:
P63600/3412
資料種別:
国際会議録

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