Fine-pattern process with negative tone resist
- 著者名:
Hoshino,E. ( Fujitsu Ltd. (Japan) ) Uraguchi,M. ( Fujitsu Ltd. (Japan) ) Yamamoto,Y. ( Fujitsu Ltd. (Japan) ) Sato,Y. ( Fujitsu Ltd. (Japan) ) Minagawa,K. ( Fujitsu Ltd. (Japan) ) Suzuki,K. ( Fujitsu Ltd. (Japan) ) Watanabe,K. ( Fujitsu Labs. Ltd. (Japan) ) - 掲載資料名:
- Photomask and X-Ray Mask Technology V
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3412
- 発行年:
- 1998
- 開始ページ:
- 214
- 終了ページ:
- 219
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819428646 [0819428647]
- 言語:
- 英語
- 請求記号:
- P63600/3412
- 資料種別:
- 国際会議録
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Resist composition effects on ultimate resolution of negative-tone chemically amplified resists
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Fabrication of isolated gates by negative-tone process and resolution enhancement technology
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