Chemical-amplification posotive-resist design for 0.18-ヲフm reticle fabricaton using the 50-kV HL-800M electron-beam system
- 著者名:
Arai,T. ( Hitachi,Ltd. (Japan) ) Sakamizu,Y. ( Hitachi,Ltd. (Japan) ) Soga,T. ( Hitachi,Ltd. (Japan) ) Satoh,H. ( Hitachi,Ltd. (Japan) ) Katoh,K. ( Hitachi Chemical Co.,Ltd. (Japan) ) Shiraishi,H. ( Hitachi,Ltd. (Japan) ) Hoga,M. ( Hitachi,Ltd. (Japan) ) - 掲載資料名:
- Photomask and X-Ray Mask Technology V
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3412
- 発行年:
- 1998
- 開始ページ:
- 190
- 終了ページ:
- 195
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819428646 [0819428647]
- 言語:
- 英語
- 請求記号:
- P63600/3412
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |