Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ヲフm-generation advanced mask fabrication
- 著者名:
Tsai,W. ( Intel Corp. (USA) ) Chen,F. ( Intel Corp. (USA) ) Kamna,M. ( Intel Corp. (USA) ) Chegwidden,S. ( Intel Corp. (USA) ) Labovitz,S.M. ( Intel Corp. (USA) ) Farnsworth,J.N. ( Intel Corp. (USA) ) Dao,G.T. ( Intel Corp. (USA) ) - 掲載資料名:
- Photomask and X-Ray Mask Technology V
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3412
- 発行年:
- 1998
- 開始ページ:
- 149
- 終了ページ:
- 162
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819428646 [0819428647]
- 言語:
- 英語
- 請求記号:
- P63600/3412
- 資料種別:
- 国際会議録
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