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IMP copper seed layer formation with TaN barrier for deep submicron

著者名:
Narayanan,B. ( Institute of Microelectronics )
Li,C.Y.
Lee,K.
Yu,B.
Wu,J.J.
Foo,P.D.
Xie,J.
さらに 2 件
掲載資料名:
Multilevel Interconnect Technology III
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3883
発行年:
1999
開始ページ:
42
終了ページ:
45
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434807 [0819434809]
言語:
英語
請求記号:
P63600/3883
資料種別:
国際会議録

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