Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system
- 著者名:
Phan,K.A. ( Advanced Micro Devices,Inc ) Spence,C.A. Dakshina-Murthy,S. Bala,V. Williams,A.M. Strener,S. Eandi,R.D. Li,J. Karklin,L. - 掲載資料名:
- 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3873
- 発行年:
- 1999
- 巻:
- Part2
- 開始ページ:
- 681
- 終了ページ:
- 694
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780849434686 [084943468X]
- 言語:
- 英語
- 請求記号:
- P63600/3873
- 資料種別:
- 国際会議録
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10
国際会議録
ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
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SPIE - The International Society for Optical Engineering |
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