Sub-0.18-ヲフm line/space lithography using 248-nm scanners and assisting feature OPC masks
- 著者名:
- Lin,H.T. ( Taiwan Semiconductor Manufacturing Co.Ltd. )
- Lin,J.C.H.
- Chiu,C.S.G.
- Wang,Y.Y.
- Yen,A.
- 掲載資料名:
- 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3873
- 発行年:
- 1999
- 巻:
- Part1
- 開始ページ:
- 307
- 終了ページ:
- 315
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780849434686 [084943468X]
- 言語:
- 英語
- 請求記号:
- P63600/3873
- 資料種別:
- 国際会議録
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