Blank Cover Image

Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers

著者名:
掲載資料名:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3873
発行年:
1999
巻:
Part1
開始ページ:
277
終了ページ:
287
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
言語:
英語
請求記号:
P63600/3873
資料種別:
国際会議録

類似資料:

1 国際会議録 Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers

Spence,C.A., Plat,M.V., Sahouria,E.Y., Cobb,N.B., Schellendberg,F.M.

SPIE - The International Society for Optical Engineering
7 国際会議録 Phase and transmission errors aware OPC solution for PSM: feasability demonstration

Toublan,O., Sahouria,E.Y., Cobb,N.B.

SPIE-The International Society for Optical Engineering
2 国際会議録 Phase aware proximity correction for advanced masks

Toublan,O., Sahouria,E.Y., Cobb,N.B., Do,T., Donnelly,T., Granik,Y., Schellenberg,F.M., Schiavone,P.

SPIE - The International Society for Optical Engineering
8 国際会議録 Phase shifting and optical proximity corrections to improve CD control on logic devices in manufacturing for sub-0.35-ｦﾌm i-line

Ackmann,P.W., Brown,S.E., Nistler,J.L., Spence,C.A.

SPIE-The International Society for Optical Engineering
3 国際会議録 OPC beyond 0.18 ｦﾌm:OPC on PSM gates

Schellenberg,F.M., Toublan,O., Cobb,N.B., Sahouria,E.Y., Hughes,G.P., MacDonald,S.S., West,C.A.

SPIE - The International Society for Optical Engineering
9 国際会議録 Advanced data preparation and design automation (Invited Paper)

Schellenberg, F.M.

SPIE-The International Society for Optical Engineering
4 国際会議録 Fully automatic side lobe detection and correction technique for attenuated phase-shift masks

Toublan,O., Cobb,N.B., Sahouria,E.Y.

SPIE-The International Society for Optical Engineering
10 国際会議録 Resolution capability and the mask error enhancement function (MEEF) for ArF and KrF lithography

Plat,M.V., Spence,C.A., Lyons,C.F., Wilkison,A.

SPIE-The International Society for Optical Engineering
5 国際会議録 Design strategies for future lithography technologies (or: OPC will never die)

Schellenberg, F.M.

SPIE-The International Society for Optical Engineering
11 国際会議録 Experimental results on optical proximity correction with variable-threshold resist model

Cobb,N.B., Zakhor,A., Reihani,M., Jahansooz,F., Raghavan,V.N.

SPIE-The International Society for Optical Engineering
6 国際会議録 Impact of optical enhancement techniques on the mask error enhancement function(MEEF)

Plat,M.V., Nguyen,K.B., Spence,C.A., Lyons,C.F., Wilkison,A.

SPIE - The International Society for Optical Engineering
12 国際会議録 Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Capodieci,L., Torres,J.A., Socha,R.J., Hollerbach,U., Chen,J.F., Os,C.van, Granik,Yu., Toublan,O., Cobb,N.B.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12