Blank Cover Image

Improved critical dimension control in 0.8-NA Laser reticle writers

著者名:
Hamaker,H.C. ( Etec Systems,Inc )
Valetin,G.E.
Martyniuk,J.
Martinez,B.G.
Pochkowski,J.M.
Hodgson,L.D.
さらに 1 件
掲載資料名:
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3873
発行年:
1999
巻:
Part1
開始ページ:
49
終了ページ:
63
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780849434686 [084943468X]
言語:
英語
請求記号:
P63600/3873
資料種別:
国際会議録

類似資料:

1 国際会議録 Improved throughput in 0.6-NA laser reticle writers

Valentin,G.E., Hamaker,H.C., Daniel,J.P., Garg,V., Sprenkel,D.R.

SPIE-The International Society for Optical Engineering
7 国際会議録 Killer defects caused by localized sub-100-nm critical dimension reticle errors

Vacca,A., Eynon,B.G., Yeomans,S.

SPIE-The International Society for Optical Engineering
2 国際会議録 ALTA 3700:extending the application space of the ALTA 3500 laser reticle writer

Morgante,C.G., Hamaker,H.C.

SPIE - The International Society for Optical Engineering
8 国際会議録 Contributions by blank vendors to critical dimension and defect errors

Unruh,J., Eynon,B.G.

SPIE-The International Society for Optical Engineering
3 国際会議録 Technical performance of the ALTA-3000 laser writer

B.J. Grenon, D.C. Defibaugh, D.M. Sprout, H.C. Hamaker, P.D. Buck

Society of Photo-optical Instrumentation Engineers
9 国際会議録 Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems

Hamaker,H.C., Burns,G.A., Buck,P.D.

SPIE-The International Society for Optical Engineering
4 国際会議録 Comparison of reticle placement performance using two-point and multipoint fitting algorithms

Hamaker,H.C., Martyniuk,J., Sills,R.M., Varner,J.K., Standiford,K.P.

SPIE-The International Society for Optical Engineering
10 国際会議録 Performance and reliability of high-power multimode lasers between 0.8 and 1ｦﾌm

Li,B., Harnagel,G.L., Craig,R.R.

SPIE-The International Society for Optical Engineering
5 国際会議録 Relative merits of using maximum error versus 3σ in describing the performance of laser-exposure reticle writing systems

H.C. Hamaker

Society of Photo-optical Instrumentation Engineers
11 国際会議録 Back to square 9: a demonstration of 9-in. reticle capability

Cummings, K.D., Schneider-Stoermann, L.U., Buttgereit, U., Irmscher, M., Mueller, D., Hudek, P., Beyer, D., Brendel, B., …

SPIE-The International Society for Optical Engineering
6 国際会議録 Improved throughput in the ALTA 3000 IC mask writing system

Valentin,G.E., Garg,V., Hamaker,H.C., Daniel,J.P., Sprenkel,D.R.

SPIE-The International Society for Optical Engineering
12 国際会議録 Improved estimates of the range of errors on photomasks using measured values of skewness and kurtosis

Hamaker,H.C.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12