TuD3:Crystallization behavior of sputter-deposited nitrogen-doped amorphous Ge2Sb2Te5 thin films
- 著者名:
Seo,H. ( LG Corporate Institute of Technology ) Jeong,T.-H. Park,J.-W. Yeon,C. Lee,D.-C. Kim,S.-J. Lim,H.-J. Kim,S.-Y. - 掲載資料名:
- ISOM/ODS '99 : joint international symposium on Optical Memory and Optical Data Strage 1999, 11-15 July 1999 Sheraton Kauai Resort, Koloa, Howaii
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3864
- 発行年:
- 1999
- 開始ページ:
- 116
- 終了ページ:
- 118
- 出版情報:
- Bellingham, Washington: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819434586 [0819434582]
- 言語:
- 英語
- 請求記号:
- P63600/3864
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society | |
SPIE - The International Society for Optical Engineering |
Trans Tech Publications |
MRS - Materials Research Society | |
Trans Tech Publications |
SPIE - The International Society for Optical Engineering |
5
国際会議録
Characterization of MIS Capacitor of BST Thin Films Deposited on Si by RF Magnetron Sputtering
MRS - Materials Research Society |
Trans Tech Publications |
6
国際会議録
(100) Oriented Platinum Thin Films Deposited by dc Magnetron Sputtering on SiO2/Si Substrates
MRS - Materials Research Society |
MRS - Materials Research Society |